Sputtering targets
The requirements for precious metal sputtering targets are higher than those of the traditional materials industry. Generally, the requirements include, for example, size, flatness, purity, various impurity contents, density, N/O/C/S ratios, grain size and defect control; higher or special requirements may include: surface roughness, resistance value, grain size uniformity, composition and microstructure uniformity, foreign matter (oxide) content and size, magnetic permeability, ultra-high density and ultra-fine grain size, etc.
- Performance Index:
We have processed target materials with a thickness ranging from 2.6mm to 6mm. We can produce products of different specifications according to customer requirements. The purity of the products is guaranteed to be ≥ 4N. There are no defects inside the products, and the surface is smooth with no obvious defects or inclusions.
- Application Area:
The application scope covers various fields such as communication, automobiles, computers and portable electrical appliances, industry, aerospace, 5G, home appliances, and so on.
